This is a PBN electrostatic chuck with heater (Pyrolytic Boron Nitride Electrostatic Chuck: PBN-ESC) manufactured using Shin-Etsu’s proprietary method.
Combining high-purity PBN produced via CVD method with our proprietary C-doped PBN technology, it delivers stable performance across a wide temperature range from room temperature to 800°C. It enables high-temperature processes unattainable with conventional electrostatic chucks, eliminating the need for ESC replacement across different operating temperatures.
Compatible with both Johnsen-Rahbek and Coulombic types, allowing selection of the optimal chucking method for your process requirements.
●Wide Temperature Range (Room Temp. to 800°C)
Our proprietary C-doped PBN technology enables stable chucking across a wide temperature range from room temperature to 800°C. It can be used across different temperature zones, significantly enhancing process flexibility.
●Supports wafers up to Φ330mm
From selecting graphite materials compatible with PBN to integrated manufacturing. Our proprietary coating technology enables production up to a maximum Φ330mm. We can also accommodate large 12-inch wafers.
●High-speed wafer heating
Reaches target temperature within approximately 10 seconds of chuck voltage application. Superior thermal conductivity characteristics allow for substantial reduction in process time, enhancing overall productivity.
●Excellent Temperature Uniformity
Advanced heating pattern formation technology and temperature distribution simulation enable wafer surface temperature control approximately ±2%. This achieves improved process reproducibility and yield enhancement.
●High purity
Each metallic impurity is less than 1ppm.
*Si is <5 ppm.
●Long-term stable performance
PBN’s excellent chemical stability and mechanical strength maintain stable performance over extended periods, even under harsh process conditions. Our proprietary special PG film deposition enhances adhesion of the overcoat layer to prevent delamination, while achieving flat temperature-resistivity characteristics.
●Selectable Chucking Types
Johnsen-Rahbek and Coulombic types are available.
Supported Wafer Sizes | 200mm, 300mm, Custom sizes (up to Φ330mm) |
Operating Temperature Range | Room Temperature to 800°C |
Chucking Method | Johnsen-Rahbek / Coulombic (Selectable) |
Electrode Configuration | Bipolar / Monopolar |
Material Purity | Each metallic impurity < 1 ppm (Si is < 5 ppm) |
Temperature Uniformity | ±2-4% (Shape-dependent) |
Chucking Force | 10-100 g/cm² (Variable depending on temperature and method) |
Surface Roughness | Ra = 0.05μm to 0.2μm* |
Flatness | 0.05mm or less* |
●Custom Design
We design and manufacture PBN-ESC products with optimal shapes and specifications tailored to customer requirements. Using our in-house simulation technology, we provide products with high heat uniformity.
●Characterization Services
We maintain state-of-the-art inspection equipment including Thermography and TC wafers. We provide detailed temperature distribution data from our evaluation chamber to support process optimization.
●Repair (Refurbishment) Services
Leveraging years of experience and expertise, we remove process deposits and damage to restore components to like new condition.
Restoration capability depends on the extent of damage.
It is typically <0.1mm. If lower flatness is required, please consult with us.
Multiple zones are supported. Since it depends on the product shape, please consult with us.
We design according to customer specifications, below 300V and below 20A.
It is typically ±0.5kV at 500°C. If you require higher insulation performance, please consult with us.
The proven maximum operating temperature is 800°C.
It cannot be used in a fluorine plasma atmosphere. Please consult with us about other operating environments.
As it depends on the customer’s operating environment, there is no specific warranty period.
We can produce thicknesses from 12mm to 25mm.
We can support up to Φ12inch.
PBN has high purity and excellent thermal conductivity, electrical insulation, and chemical stability. It is particularly stable in high-temperature environments and can be used over a wide temperature range up to 800°C.
Yes, it is. We provide products optimized to your process requirements, including wafer size, electrode patterns, and heater design.
Frequently Asked Questions
Frequently Asked Questions
PBN Crucible
Applications
Compound Semiconductor Crystal Growth
Molecular Beam Epitaxy (MBE) equipment
Electron Beam (EB) evaporation
Metal melting
PBN Machined Parts/
PBN Sheets/
Ultra-High Purity BN Raw Materials
Applications
High-Vacuum Insulation Components,Heater Support,High Purity Boron Nitride (BN) material
PBN Coated graphite Materials
Applications
Corrosion-resistant coating for graphite components (graphite heaters, susceptors, etc.)
PG/PBN Heater
Applications
CVD equipment, Sputtering Equipment
Pyrolytic Boron Nitride
Electrostatic Chuck
Applications
High-temperature Sputtering Equipment,Ion Implantation Equipment
Contact us for consultation, quotes and documents.
Please contact us via the inquiry form with details about your needs.
We will provide proposals tailored to your requirements.