PBN Crucible

PBN has high thermal conductivity in the in-plane direction and excellent thermal insulation in the thickness direction, enabling uniform heating of contents while minimizing energy loss. With its thin yet durable construction and chemical stability, it is ideal for applications such as crystal growth, vapor deposition, and powder processing.
Crucibles are containers for raw materials, so the materials used require high purity. PBN has high purity even compared to conventional boron nitride sintered crucibles, effectively preventing impurity contamination. Furthermore, Shin-Etsu Chemical can manufacture crucibles with complex shapes and also offers products with proprietary coatings that provide higher thermal retention than standard products.

Crucibles for Compound Semiconductor Crystal Manufacturing

Mainly used for the crystal manufacturing of III-V compound semiconductors such as GaAs and InP.
*Also proven for non-III-V applications

LEC Crucibles

These crucibles are for growing compound semiconductor single crystal using the Liquid Encapsulated Czochralski (LEC) method. They can be used not only for crystal manufacturing but also for metal melting.

Available Sizes

Maximum Φ400 × H560 mm
*Larger sizes require consultation.

VGF Crucibles

These crucibles are designed for growing compound semiconductor single crystal using the Vertical Gradient Freezing (VGF) method. We also offer specifications with a detachable seed section. Additionally, we can manufacture crucibles for the Vertical Bridgman (VB) method.

Available Sizes

Maximum Φ300×H500 mm
*Larger sizes require consultation.

Boat Crucibles

These are crucibles designed for growing compound semiconductor single crystal using the Horizontal Bridgman (HB) method. They can also be used as source material crucibles for large-area deposition applications, such as CIGS solar panels, flat panel displays (FPD), and organic light-emitting diodes (OLED).

Available Sizes

Maximum W100×L900×H70 mm
*Larger sizes require consultation.

Crucible for molecular beam epitaxy (MBE) equipment

These are source material crucibles for thin film deposition on semiconductor wafers using the molecular beam epitaxy (MBE) method.
We specialize in manufacturing crucibles with complex shapes. Please consult with us even for cases that other companies found difficult. We also support inner surface polishing, double wall processing, and cleaning treatments.

Available Sizes

Maximum Φ200×H500 mm
*Larger sizes require consultation.

Coating Options

We also offer black coating to maintain crucible temperature.

Pyrolytic graphite (PG) coating

This is a common coating method that enhances heat retention with a pyrolytic graphite film.

Shin-Etsu Special coating

Unlike pyrolytic graphite (PG) coatings, this is an insulating coating that has a higher infrared absorption rate than PG. It enables superior heat retention with less energy (energy-saving).

*For more details, please contact us through the inquiry form

Coating Film Thickness

20~100 μm

Crucible for molecular beam epitaxy (MBE) equipment

Electron Beam (EB) evaporation crucibles

These are crucibles for electron beam evaporation, called hearth liners. Unlike isotropic materials such as graphite, PBN has anisotropic properties, which allows thermal stress to be dispersed between layers, resulting in long service life. Additionally, Shin-Etsu Chemical’s unique design has achieved even greater durability (extended service life).
A conductive pyrolytic graphite (PG) coating is applied to dissipate the charge accumulated by the electron beam.

Available Sizes

Standard size Φ50×H20-50 mm
*Larger sizes require consultation.

Electron Beam (EB) evaporation crucibles

Crucibles for Analysis

PBN combines high purity with excellent corrosion resistance and is also highly resistant to acids, making it ideal for measuring metal impurities. Therefore, it can be used as a container for measuring impurities in samples. A pouring spout can also be attached.